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Reliable wafer-scale integration of two-dimensional materials and metal electrodes with van der Waals contacts

Author

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  • Xiaodong Zhang

    (University of Science and Technology of China
    University of Science and Technology of China
    University of Science and Technology of China)

  • Chenxi Huang

    (University of Science and Technology of China
    University of Science and Technology of China
    University of Science and Technology of China)

  • Zeyu Li

    (University of Science and Technology of China
    University of Science and Technology of China
    University of Science and Technology of China)

  • Jun Fu

    (University of Science and Technology of China
    University of Science and Technology of China
    University of Science and Technology of China)

  • Jiaran Tian

    (University of Science and Technology of China
    University of Science and Technology of China)

  • Zhuping Ouyang

    (University of Science and Technology of China
    University of Science and Technology of China)

  • Yuliang Yang

    (University of Science and Technology of China
    University of Science and Technology of China)

  • Xiang Shao

    (University of Science and Technology of China)

  • Yulei Han

    (Fuzhou University)

  • Zhenhua Qiao

    (University of Science and Technology of China
    University of Science and Technology of China
    University of Science and Technology of China)

  • Hualing Zeng

    (University of Science and Technology of China
    University of Science and Technology of China
    University of Science and Technology of China)

Abstract

Since the first report on single-layer MoS2 based transistor, rapid progress has been achieved in two-dimensional (2D) material-based atomically thin electronics, providing an alternative approach to solve the bottleneck in silicon device miniaturization. In this scenario, reliable contact between the metal electrodes and the subnanometer-thick 2D materials becomes crucial in determining the device performance. Here, utilizing the quasi-van der Waals (vdW) epitaxy of metals on fluorophlogopite mica, we demonstrate an all-stacking method for the fabrication of 2D devices with high-quality vdW contacts by mechanically transferring pre-deposited metal electrodes. This technique is applicable for complex device integration with sizes up to the wafer scale and is also capable of tuning the electric characteristics of the interfacial junctions by transferring selective metals. Our results provide an efficient, scalable, and low-cost technique for 2D electronics, allowing high-density device integration as well as a handy tool for fundamental research in vdW materials.

Suggested Citation

  • Xiaodong Zhang & Chenxi Huang & Zeyu Li & Jun Fu & Jiaran Tian & Zhuping Ouyang & Yuliang Yang & Xiang Shao & Yulei Han & Zhenhua Qiao & Hualing Zeng, 2024. "Reliable wafer-scale integration of two-dimensional materials and metal electrodes with van der Waals contacts," Nature Communications, Nature, vol. 15(1), pages 1-9, December.
  • Handle: RePEc:nat:natcom:v:15:y:2024:i:1:d:10.1038_s41467-024-49058-7
    DOI: 10.1038/s41467-024-49058-7
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