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Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Author

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  • David Barcons Ruiz

    (The Barcelona Institute of Science and Technology)

  • Hanan Herzig Sheinfux

    (The Barcelona Institute of Science and Technology)

  • Rebecca Hoffmann

    (The Barcelona Institute of Science and Technology)

  • Iacopo Torre

    (The Barcelona Institute of Science and Technology)

  • Hitesh Agarwal

    (The Barcelona Institute of Science and Technology)

  • Roshan Krishna Kumar

    (The Barcelona Institute of Science and Technology)

  • Lorenzo Vistoli

    (The Barcelona Institute of Science and Technology)

  • Takashi Taniguchi

    (National Institute for Materials Science
    National Institute for Materials Science)

  • Kenji Watanabe

    (National Institute for Materials Science
    National Institute for Materials Science)

  • Adrian Bachtold

    (The Barcelona Institute of Science and Technology
    ICREA—Institució Catalana de Recerca i Estudis Avançats)

  • Frank H. L. Koppens

    (The Barcelona Institute of Science and Technology
    ICREA—Institució Catalana de Recerca i Estudis Avançats)

Abstract

Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~30 nm pitch using electron beam lithography. Here, we demonstrate a nanofabrication technique which allows patterning periodic structures with a pitch down to 16 nm. It is based on focused ion beam milling of suspended membranes, with minimal proximity effects typical to standard electron beam lithography. The membranes are then transferred and used as hard etching masks. We benchmark our technique by electrostatically inducing a superlattice potential in graphene and observe bandstructure modification in electronic transport. Our technique opens the path towards the realization of very short period superlattices in 2D materials, but with the ability to control lattice symmetries and strength. This can pave the way for a versatile solid-state quantum simulator platform and the study of correlated electron phases.

Suggested Citation

  • David Barcons Ruiz & Hanan Herzig Sheinfux & Rebecca Hoffmann & Iacopo Torre & Hitesh Agarwal & Roshan Krishna Kumar & Lorenzo Vistoli & Takashi Taniguchi & Kenji Watanabe & Adrian Bachtold & Frank H., 2022. "Engineering high quality graphene superlattices via ion milled ultra-thin etching masks," Nature Communications, Nature, vol. 13(1), pages 1-7, December.
  • Handle: RePEc:nat:natcom:v:13:y:2022:i:1:d:10.1038_s41467-022-34734-3
    DOI: 10.1038/s41467-022-34734-3
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