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Ultra-high precision nano additive manufacturing of metal oxide semiconductors via multi-photon lithography

Author

Listed:
  • Chun Cao

    (Hangzhou Dianzi University)

  • Xianmeng Xia

    (Zhejiang Lab)

  • Xiaoming Shen

    (ZJU-Hangzhou Global Scientific and Technological Innovation Center)

  • Xiaobing Wang

    (Zhejiang Lab)

  • Zhenyao Yang

    (Zhejiang Lab)

  • Qiulan Liu

    (Zhejiang University)

  • Chenliang Ding

    (Zhejiang University)

  • Dazhao Zhu

    (Zhejiang University)

  • Cuifang Kuang

    (ZJU-Hangzhou Global Scientific and Technological Innovation Center
    Zhejiang University)

  • Xu Liu

    (ZJU-Hangzhou Global Scientific and Technological Innovation Center
    Zhejiang University)

Abstract

As a basic component of the versatile semiconductor devices, metal oxides play a critical role in modern electronic information industry. However, ultra-high precision nanopatterning of metal oxides often involves multi-step lithography and transfer process, which is time-consuming and costly. Here, we report a strategy, using metal-organic compounds as solid precursor photoresist for multi-photon lithography and post-sintering, to realize ultra-high precision additive manufacturing of metal oxides. As a result, we gain metal oxides including ZnO, CuO and ZrO2 with a critical dimension of 35 nm, which sets a benchmark for additive manufacturing of metal oxides. Besides, atomic doping can be easily accomplished by including the target element in precursor photoresist, and heterogeneous structures can also be created by multiple multi-photon lithography, allowing this strategy to accommodate the requirements of various semiconductor devices. For instance, we fabricate an ZnO photodetector by the proposed strategy.

Suggested Citation

  • Chun Cao & Xianmeng Xia & Xiaoming Shen & Xiaobing Wang & Zhenyao Yang & Qiulan Liu & Chenliang Ding & Dazhao Zhu & Cuifang Kuang & Xu Liu, 2024. "Ultra-high precision nano additive manufacturing of metal oxide semiconductors via multi-photon lithography," Nature Communications, Nature, vol. 15(1), pages 1-11, December.
    • Handle: RePEc:nat:natcom:v:15:y:2024:i:1:d:10.1038_s41467-024-52929-8
    DOI: 10.1038/s41467-024-52929-8
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    References listed on IDEAS

    as
    1. Xi Liu & Leilei Gu & Qianpeng Zhang & Jiyuan Wu & Yunze Long & Zhiyong Fan, 2014. "All-printable band-edge modulated ZnO nanowire photodetectors with ultra-high detectivity," Nature Communications, Nature, vol. 5(1), pages 1-9, September.
    2. Liang Yang & Hongrong Hu & Alexander Scholz & Florian Feist & Gabriel Cadilha Marques & Steven Kraus & Niklas Maximilian Bojanowski & Eva Blasco & Christopher Barner-Kowollik & Jasmin Aghassi-Hagmann , 2023. "Laser printed microelectronics," Nature Communications, Nature, vol. 14(1), pages 1-10, December.
    3. Max A. Saccone & Rebecca A. Gallivan & Kai Narita & Daryl W. Yee & Julia R. Greer, 2022. "Additive manufacturing of micro-architected metals via hydrogel infusion," Nature, Nature, vol. 612(7941), pages 685-690, December.
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