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Optimal reduction of a spatial monitoring grid: Proposals and applications in process control

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  • Borgoni, Riccardo
  • Radaelli, Luigi
  • Tritto, Valeria
  • Zappa, Diego

Abstract

Deposition of silicon dioxide (SiO2) is a critical step of integrated circuit manufacturing; hence it is monitored during the manufacturing process at a grid of points defined on the wafer area. Since collecting thickness measurements is expensive, it is a compelling issue to investigate how a sub grid can be identified. A strategy based on spatial prediction and simulating annealing is proposed to tackle the problem which proved to be effective when applied to a real process. A diagnostic device for monitoring the deposition process is also discussed which can be usefully adopted in the day-to-day activity by practitioners acting in process control of a microelectronics fab.

Suggested Citation

  • Borgoni, Riccardo & Radaelli, Luigi & Tritto, Valeria & Zappa, Diego, 2013. "Optimal reduction of a spatial monitoring grid: Proposals and applications in process control," Computational Statistics & Data Analysis, Elsevier, vol. 58(C), pages 407-419.
    • Handle: RePEc:eee:csdana:v:58:y:2013:i:c:p:407-419
    DOI: 10.1016/j.csda.2012.08.007
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    References listed on IDEAS

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    1. Peter Diggle & Søren Lophaven, 2006. "Bayesian Geostatistical Design," Scandinavian Journal of Statistics, Danish Society for Theoretical Statistics;Finnish Statistical Society;Norwegian Statistical Association;Swedish Statistical Association, vol. 33(1), pages 53-64, March.
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