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Van der Waals negative capacitance transistors

Author

Listed:
  • Xiaowei Wang

    (Nanyang Technological University)

  • Peng Yu

    (Nanyang Technological University
    Sun Yat-sen University)

  • Zhendong Lei

    (National University of Singapore)

  • Chao Zhu

    (Nanyang Technological University)

  • Xun Cao

    (Nanyang Technological University)

  • Fucai Liu

    (Nanyang Technological University)

  • Lu You

    (Nanyang Technological University)

  • Qingsheng Zeng

    (Nanyang Technological University)

  • Ya Deng

    (Nanyang Technological University)

  • Chao Zhu

    (Nanyang Technological University)

  • Jiadong Zhou

    (Nanyang Technological University)

  • Qundong Fu

    (Nanyang Technological University)

  • Junling Wang

    (Nanyang Technological University)

  • Yizhong Huang

    (Nanyang Technological University)

  • Zheng Liu

    (Nanyang Technological University
    CINTRA CNRS/NTU/THALES
    Nanyang Technological University
    Nanyang Environment and Water Research Institute)

Abstract

The Boltzmann distribution of electrons sets a fundamental barrier to lowering energy consumption in metal-oxide-semiconductor field-effect transistors (MOSFETs). Negative capacitance FET (NC-FET), as an emerging FET architecture, is promising to overcome this thermionic limit and build ultra-low-power consuming electronics. Here, we demonstrate steep-slope NC-FETs based on two-dimensional molybdenum disulfide and CuInP2S6 (CIPS) van der Waals (vdW) heterostructure. The vdW NC-FET provides an average subthreshold swing (SS) less than the Boltzmann’s limit for over seven decades of drain current, with a minimum SS of 28 mV dec−1. Negligible hysteresis is achieved in NC-FETs with the thickness of CIPS less than 20 nm. A voltage gain of 24 is measured for vdW NC-FET logic inverter. Flexible vdW NC-FET is further demonstrated with sub-60 mV dec−1 switching characteristics under the bending radius down to 3.8 mm. These results demonstrate the great potential of vdW NC-FET for ultra-low-power and flexible applications.

Suggested Citation

  • Xiaowei Wang & Peng Yu & Zhendong Lei & Chao Zhu & Xun Cao & Fucai Liu & Lu You & Qingsheng Zeng & Ya Deng & Chao Zhu & Jiadong Zhou & Qundong Fu & Junling Wang & Yizhong Huang & Zheng Liu, 2019. "Van der Waals negative capacitance transistors," Nature Communications, Nature, vol. 10(1), pages 1-8, December.
  • Handle: RePEc:nat:natcom:v:10:y:2019:i:1:d:10.1038_s41467-019-10738-4
    DOI: 10.1038/s41467-019-10738-4
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    Cited by:

    1. Heng Liu & Qinglin Lai & Jun Fu & Shijie Zhang & Zhaoming Fu & Hualing Zeng, 2024. "Reversible flexoelectric domain engineering at the nanoscale in van der Waals ferroelectrics," Nature Communications, Nature, vol. 15(1), pages 1-9, December.
    2. Gyuho Myeong & Wongil Shin & Kyunghwan Sung & Seungho Kim & Hongsik Lim & Boram Kim & Taehyeok Jin & Jihoon Park & Taehun Lee & Michael S. Fuhrer & Kenji Watanabe & Takashi Taniguchi & Fei Liu & Sungj, 2022. "Dirac-source diode with sub-unity ideality factor," Nature Communications, Nature, vol. 13(1), pages 1-6, December.

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