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National Technology Policy in Global Markets: Developing Next-Generation Lithography in the Semiconductor Industry

Author

Listed:
  • Linden Greg

    (University of California at Berkeley)

  • Mowery David C.

    (University of California at Berkeley)

  • Ham Ziedonis Rosemarie

    (University of Pennsylvania)

Abstract

Since the late 1980s, the Cooperative Research and Development Agreement (CRADA) has been a prominent vehicle used to support collaboration between US federal laboratories and private firms. This paper examines the structure and goals of one of the most ambitious CRADAs conducted to date, the EUV CRADA, which involves three Department of Energy laboratories and leading US firms in the semiconductor industry and is aimed at the development of next-generation lithographic technologies. This large project is an important case study in 'post-Cold-War' technology policy and government-industry collaboration. Although the EUV project represents significant improvements in the design and management of CRADAs, it also illustrates the inherent difficulties of balancing political and economic goals in complex technology development programs.

Suggested Citation

  • Linden Greg & Mowery David C. & Ham Ziedonis Rosemarie, 2000. "National Technology Policy in Global Markets: Developing Next-Generation Lithography in the Semiconductor Industry," Business and Politics, De Gruyter, vol. 2(2), pages 1-22, August.
    • Handle: RePEc:bpj:buspol:v:2:y:2000:i:2:n:1
    DOI: 10.2202/1469-3569.1005
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    Citations

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    Cited by:

    1. Kapoor, Rahul & McGrath, Patia J., 2014. "Unmasking the interplay between technology evolution and R&D collaboration: Evidence from the global semiconductor manufacturing industry, 1990–2010," Research Policy, Elsevier, vol. 43(3), pages 555-569.
    2. Möllering, Guido, 2010. "Collective market-making efforts at an engineering conference," MPIfG Discussion Paper 10/2, Max Planck Institute for the Study of Societies.
    3. Melissa M. Appleyard & Clara Y. Wang & J. Alexander Liddle & John Carruthers, 2008. "The innovator's non-dilemma: the case of next-generation lithography," Managerial and Decision Economics, John Wiley & Sons, Ltd., vol. 29(5), pages 407-423.
    4. Lange, Knut & Müller-Seitz, Gordon & Sydow, Jörg & Windeler, Arnold, 2013. "Financing innovations in uncertain networks—Filling in roadmap gaps in the semiconductor industry," Research Policy, Elsevier, vol. 42(3), pages 647-661.
    5. Möllering, Guido & Müller-Seitz, Gordon, 2018. "Direction, not destination: Institutional work practices in the face of field-level uncertainty," European Management Journal, Elsevier, vol. 36(1), pages 28-37.
    6. Schubert, Cornelius & Sydow, Jörg & Windeler, Arnold, 2013. "The means of managing momentum: Bridging technological paths and organisational fields," Research Policy, Elsevier, vol. 42(8), pages 1389-1405.

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