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Flat-surface-assisted and self-regulated oxidation resistance of Cu(111)

Author

Listed:
  • Su Jae Kim

    (Pusan National University)

  • Yong In Kim

    (Sungkyunkwan University)

  • Bipin Lamichhane

    (Mississippi State University)

  • Young-Hoon Kim

    (Sungkyunkwan University)

  • Yousil Lee

    (Pusan National University)

  • Chae Ryong Cho

    (Pusan National University)

  • Miyeon Cheon

    (Pusan National University)

  • Jong Chan Kim

    (Ulsan National Institute of Science and Technology)

  • Hu Young Jeong

    (Ulsan National Institute of Science and Technology)

  • Taewoo Ha

    (Sungkyunkwan University)

  • Jungdae Kim

    (University of Ulsan)

  • Young Hee Lee

    (Sungkyunkwan University
    Sungkyunkwan University
    Sungkyunkwan University)

  • Seong-Gon Kim

    (Mississippi State University)

  • Young-Min Kim

    (Sungkyunkwan University
    Sungkyunkwan University)

  • Se-Young Jeong

    (Pusan National University
    Pusan National University)

Abstract

Oxidation can deteriorate the properties of copper that are critical for its use, particularly in the semiconductor industry and electro-optics applications1–7. This has prompted numerous studies exploring copper oxidation and possible passivation strategies8. In situ observations have, for example, shown that oxidation involves stepped surfaces: Cu2O growth occurs on flat surfaces as a result of Cu adatoms detaching from steps and diffusing across terraces9–11. But even though this mechanism explains why single-crystalline copper is more resistant to oxidation than polycrystalline copper, the fact that flat copper surfaces can be free of oxidation has not been explored further. Here we report the fabrication of copper thin films that are semi-permanently oxidation resistant because they consist of flat surfaces with only occasional mono-atomic steps. First-principles calculations confirm that mono-atomic step edges are as impervious to oxygen as flat surfaces and that surface adsorption of O atoms is suppressed once an oxygen face-centred cubic (fcc) surface site coverage of 50% has been reached. These combined effects explain the exceptional oxidation resistance of ultraflat Cu surfaces.

Suggested Citation

  • Su Jae Kim & Yong In Kim & Bipin Lamichhane & Young-Hoon Kim & Yousil Lee & Chae Ryong Cho & Miyeon Cheon & Jong Chan Kim & Hu Young Jeong & Taewoo Ha & Jungdae Kim & Young Hee Lee & Seong-Gon Kim & Y, 2022. "Flat-surface-assisted and self-regulated oxidation resistance of Cu(111)," Nature, Nature, vol. 603(7901), pages 434-438, March.
    • Handle: RePEc:nat:nature:v:603:y:2022:i:7901:d:10.1038_s41586-021-04375-5
    DOI: 10.1038/s41586-021-04375-5
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    Cited by:

    1. Taewoo Ha & Yu-Seong Seo & Teun-Teun Kim & Bipin Lamichhane & Young-Hoon Kim & Su Jae Kim & Yousil Lee & Jong Chan Kim & Sang Eon Park & Kyung Ik Sim & Jae Hoon Kim & Yong In Kim & Seon Je Kim & Hu Yo, 2023. "Coherent consolidation of trillions of nucleations for mono-atom step-level flat surfaces," Nature Communications, Nature, vol. 14(1), pages 1-9, December.
    2. Lu, Buchu & Yan, Xiangyu & Liu, Qibin, 2023. "Enhanced solar hydrogen generation with the direct coupling of photo and thermal energy – An experimental and mechanism study," Applied Energy, Elsevier, vol. 331(C).
    3. Weiqing Xue & Xinyan Liu & Chunxiao Liu & Xinyan Zhang & Jiawei Li & Zhengwu Yang & Peixin Cui & Hong-Jie Peng & Qiu Jiang & Hongliang Li & Pengping Xu & Tingting Zheng & Chuan Xia & Jie Zeng, 2023. "Electrosynthesis of polymer-grade ethylene via acetylene semihydrogenation over undercoordinated Cu nanodots," Nature Communications, Nature, vol. 14(1), pages 1-9, December.

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