IDEAS home Printed from https://ideas.repec.org/a/nat/nature/v469y2011i7331d10.1038_nature09697.html
   My bibliography  Save this article

Hard-tip, soft-spring lithography

Author

Listed:
  • Wooyoung Shim

    (Northwestern University, 2220 Campus Drive
    International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA)

  • Adam B. Braunschweig

    (International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Present address: Department of Chemistry, New York University, 100 Washington Square East, New York, New York 10003, USA)

  • Xing Liao

    (Northwestern University, 2220 Campus Drive
    International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA)

  • Jinan Chai

    (International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA)

  • Jong Kuk Lim

    (International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA)

  • Gengfeng Zheng

    (International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Present address: Laboratory of Advanced Materials & Department of Chemistry, Fudan University, 2205 Song-Hu Road, Shanghai, 200438, China)

  • Chad A. Mirkin

    (Northwestern University, 2220 Campus Drive
    International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
    Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA)

Abstract

Lithographic tips Scanning probe techniques such as atomic-force microscopy can be readily harnessed to prepare nanoscale structures with exquisite resolution, but are not generally suitable for high-throughput patterning. Techniques based on contact printing, by contrast, offer high throughput over large areas, but cannot compete on resolution. Now, Wooyoung Shim and colleagues describe an approach that offers the best of both worlds. By attaching an array of hard, scanning-probe-like silicon tips to a flexible elastomeric substrate (similar to those used in contact printing), they are able to rapidly create arbitrary patterns with sub-50-nanometre resolution over centimetre-scale areas. This new nanolithography strategy should be suitable for a range of rapid prototyping applications in both industrial and research applications.

Suggested Citation

  • Wooyoung Shim & Adam B. Braunschweig & Xing Liao & Jinan Chai & Jong Kuk Lim & Gengfeng Zheng & Chad A. Mirkin, 2011. "Hard-tip, soft-spring lithography," Nature, Nature, vol. 469(7331), pages 516-520, January.
    • Handle: RePEc:nat:nature:v:469:y:2011:i:7331:d:10.1038_nature09697
    DOI: 10.1038/nature09697
    as

    Download full text from publisher

    File URL: https://www.nature.com/articles/nature09697
    File Function: Abstract
    Download Restriction: Access to the full text of the articles in this series is restricted.
    File URL: https://libkey.io/10.1038/nature09697?utm_source=ideas
    LibKey link: if access is restricted and if your library uses this service, LibKey will redirect you to where you can use your library subscription to access this item
    ---><---

    As the access to this document is restricted, you may want to search for a different version of it.

    Citations

    Citations are extracted by the CitEc Project, subscribe to its RSS feed for this item.
    as


    Cited by:

    1. Youyou Lu & Xuan Zhang & Liyan Zhao & Hong Liu & Mi Yan & Xiaochen Zhang & Kenji Mochizuki & Shikuan Yang, 2023. "Metal-organic framework template-guided electrochemical lithography on substrates for SERS sensing applications," Nature Communications, Nature, vol. 14(1), pages 1-12, December.

    More about this item

    Statistics

    Access and download statistics

    Corrections

    All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:nat:nature:v:469:y:2011:i:7331:d:10.1038_nature09697. See general information about how to correct material in RePEc.

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    We have no bibliographic references for this item. You can help adding them by using this form .

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Sonal Shukla or Springer Nature Abstracting and Indexing (email available below). General contact details of provider: http://www.nature.com .

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.