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Solution-processed silicon films and transistors

Author

Listed:
  • Tatsuya Shimoda

    (Seiko Epson Corporation)

  • Yasuo Matsuki

    (JSR Corporation)

  • Masahiro Furusawa

    (Seiko Epson Corporation)

  • Takashi Aoki

    (Seiko Epson Corporation)

  • Ichio Yudasaka

    (Seiko Epson Corporation)

  • Hideki Tanaka

    (Seiko Epson Corporation)

  • Haruo Iwasawa

    (JSR Corporation)

  • Daohai Wang

    (JSR Corporation)

  • Masami Miyasaka

    (Seiko Epson Corporation)

  • Yasumasa Takeuchi

    (JSR Corporation
    International Centre for Material Research)

Abstract

Semiconductor solutions The manufacture of silicon semiconductor devices involves complicated photolithography and expensive machinery, so many researchers are seeking alternative semiconductor materials that can be handled by simple processes such as spin-coating or printing. Organic semiconductors are the most promising candidates but they still lack performance and reliability. Shimoda et al. have taken a different approach, printing a silicon transistor itself, not a substitute. They successfully fabricated polycrystalline silicon transistors by spin-coating a novel liquid precursor. This solution-based approach can also be adapted for ‘ink-jet’ printing of transistors.

Suggested Citation

  • Tatsuya Shimoda & Yasuo Matsuki & Masahiro Furusawa & Takashi Aoki & Ichio Yudasaka & Hideki Tanaka & Haruo Iwasawa & Daohai Wang & Masami Miyasaka & Yasumasa Takeuchi, 2006. "Solution-processed silicon films and transistors," Nature, Nature, vol. 440(7085), pages 783-786, April.
  • Handle: RePEc:nat:nature:v:440:y:2006:i:7085:d:10.1038_nature04613
    DOI: 10.1038/nature04613
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    Cited by:

    1. Sharifi, Farrokh & Ghobadian, Sasan & Cavalcanti, Flavia R. & Hashemi, Nastaran, 2015. "Paper-based devices for energy applications," Renewable and Sustainable Energy Reviews, Elsevier, vol. 52(C), pages 1453-1472.

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