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Selective metal deposition at graphene line defects by atomic layer deposition

Author

Listed:
  • Kwanpyo Kim

    (Stanford University
    Ulsan National Institute of Science and Technology (UNIST))

  • Han-Bo-Ram Lee

    (Stanford University
    Incheon National University)

  • Richard W. Johnson

    (Stanford University)

  • Jukka T. Tanskanen

    (Stanford University
    University of Eastern Finland)

  • Nan Liu

    (Stanford University)

  • Myung-Gil Kim

    (Stanford University
    Chung-Ang University, 221 Heukseok-dong, Dongjak-gu)

  • Changhyun Pang

    (Stanford University
    School of Chemical Engineering, Sungkyunkwan University (SKKU))

  • Chiyui Ahn

    (Stanford University)

  • Stacey F. Bent

    (Stanford University)

  • Zhenan Bao

    (Stanford University)

Abstract

One-dimensional defects in graphene have a strong influence on its physical properties, such as electrical charge transport and mechanical strength. With enhanced chemical reactivity, such defects may also allow us to selectively functionalize the material and systematically tune the properties of graphene. Here we demonstrate the selective deposition of metal at chemical vapour deposited graphene’s line defects, notably grain boundaries, by atomic layer deposition. Atomic layer deposition allows us to deposit Pt predominantly on graphene’s grain boundaries, folds and cracks due to the enhanced chemical reactivity of these line defects, which is directly confirmed by transmission electron microscopy imaging. The selective functionalization of graphene defect sites, together with the nanowire morphology of deposited Pt, yields a superior platform for sensing applications. Using Pt–graphene hybrid structures, we demonstrate high-performance hydrogen gas sensors at room temperature and show its advantages over other evaporative Pt deposition methods, in which Pt decorates the graphene surface non-selectively.

Suggested Citation

  • Kwanpyo Kim & Han-Bo-Ram Lee & Richard W. Johnson & Jukka T. Tanskanen & Nan Liu & Myung-Gil Kim & Changhyun Pang & Chiyui Ahn & Stacey F. Bent & Zhenan Bao, 2014. "Selective metal deposition at graphene line defects by atomic layer deposition," Nature Communications, Nature, vol. 5(1), pages 1-9, December.
  • Handle: RePEc:nat:natcom:v:5:y:2014:i:1:d:10.1038_ncomms5781
    DOI: 10.1038/ncomms5781
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    Cited by:

    1. Jeongwon Park & Seung Jae Kwak & Sumin Kang & Saeyoung Oh & Bongki Shin & Gichang Noh & Tae Soo Kim & Changhwan Kim & Hyeonbin Park & Seung Hoon Oh & Woojin Kang & Namwook Hur & Hyun-Jun Chai & Minsoo, 2024. "Area-selective atomic layer deposition on 2D monolayer lateral superlattices," Nature Communications, Nature, vol. 15(1), pages 1-11, December.
    2. Yicheng Li & Zilian Qi & Yuxiao Lan & Kun Cao & Yanwei Wen & Jingming Zhang & Eryan Gu & Junzhou Long & Jin Yan & Bin Shan & Rong Chen, 2023. "Self-aligned patterning of tantalum oxide on Cu/SiO2 through redox-coupled inherently selective atomic layer deposition," Nature Communications, Nature, vol. 14(1), pages 1-10, December.

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