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Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

Author

Listed:
  • David J. Beesley

    (Imperial College London, Prince Consort Road, South Kensington
    Imperial College London, Exhibition Road, South Kensington)

  • James Semple

    (Imperial College London, Prince Consort Road, South Kensington)

  • Lethy Krishnan Jagadamma

    (Solar and Photovoltaic Engineering Research, King Abdullah University of Science and Technology (KAUST))

  • Aram Amassian

    (Solar and Photovoltaic Engineering Research, King Abdullah University of Science and Technology (KAUST))

  • Martyn A. McLachlan

    (Imperial College London, Exhibition Road, South Kensington)

  • Thomas D. Anthopoulos

    (Imperial College London, Prince Consort Road, South Kensington)

  • John C. deMello

    (Imperial College London, Exhibition Road, South Kensington)

Abstract

Coplanar electrodes formed from asymmetric metals separated on the nanometre length scale are essential elements of nanoscale photonic and electronic devices. Existing fabrication methods typically involve electron-beam lithography—a technique that enables high fidelity patterning but suffers from significant limitations in terms of low throughput, poor scalability to large areas and restrictive choice of substrate and electrode materials. Here, we describe a versatile method for the rapid fabrication of asymmetric nanogap electrodes that exploits the ability of selected self-assembled monolayers to attach conformally to a prepatterned metal layer and thereby weaken adhesion to a subsequently deposited metal film. The method may be carried out under ambient conditions using simple equipment and a minimum of processing steps, enabling the rapid fabrication of nanogap electrodes and optoelectronic devices with aspect ratios in excess of 100,000.

Suggested Citation

  • David J. Beesley & James Semple & Lethy Krishnan Jagadamma & Aram Amassian & Martyn A. McLachlan & Thomas D. Anthopoulos & John C. deMello, 2014. "Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography," Nature Communications, Nature, vol. 5(1), pages 1-9, September.
    • Handle: RePEc:nat:natcom:v:5:y:2014:i:1:d:10.1038_ncomms4933
    DOI: 10.1038/ncomms4933
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    Cited by:

    1. Kalaivanan Loganathan & Hendrik Faber & Emre Yengel & Akmaral Seitkhan & Azamat Bakytbekov & Emre Yarali & Begimai Adilbekova & Afnan AlBatati & Yuanbao Lin & Zainab Felemban & Shuai Yang & Weiwei Li , 2022. "Rapid and up-scalable manufacturing of gigahertz nanogap diodes," Nature Communications, Nature, vol. 13(1), pages 1-8, December.

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