IDEAS home Printed from https://ideas.repec.org/a/gam/jijerp/v15y2018i6p1162-d150364.html
   My bibliography  Save this article

Comprehensive Evaluation of Hazardous Chemical Exposure Control System at a Semiconductor Manufacturing Company in South Korea

Author

Listed:
  • Sangjun Choi

    (Department of Occupational Health, Daegu Catholic University, Gyeongbuk 38430, Korea)

  • Chungsik Yoon

    (Department of Environmental Health Science and Institute of Health and Environment, Graduate School of Public Health, Seoul National University, Seoul 08826, Korea)

  • Seungwon Kim

    (Department of Public Health, Keimyung University, Daegu 42601, Korea)

  • Won Kim

    (Wonjin Institute for Occupational and Environmental Health, Seoul 02221, Korea)

  • Kwonchul Ha

    (Department of Biohealth Science, Changwon National University, Changwon 51140, Korea)

  • Jeeyeon Jeong

    (Department of Occupational and Environmental Health, Yongin University, Yongin 17092, Korea)

  • Jongcheul Kim

    (Boram E&T Co.Ltd., Gwangju 61007, Korea)

  • Jungah Shin

    (Occupational Lung Disease Institute, Korea Workers’ Compensation and Welfare Service, Incheon 21417, Korea)

  • Donguk Park

    (Department of Environmental Health, Korea National Open University, Seoul 03087, Korea)

Abstract

The goal of this study was to evaluate the hazardous chemical exposure control system in a semiconductor manufacturing company and recommend an appropriate exposure surveillance system for hazardous agents. We reviewed compliance-based chemical exposure data compiled between 2012 and 2014 by the study company. The chemical management system, characteristics of chemical use and hazardous gas monitoring system were also investigated. We evaluated the airborne isopropyl alcohol (IPA) and acetone generally used as cleaning solvents, volatile organic compounds and metals levels using internationally recommended sampling and analytical methods. Based on the results of past working environment measurement data and of our investigation, the overall current exposure to chemicals by semiconductor workers during routine production work appears to be controlled below occupational exposure limits. About 40% of chemical products used were found to contain at least one unidentifiable trade-secret substance. There are several situations and maintenance tasks that need special attention to reduce exposure to carcinogens as much as possible. In addition, a job-exposure matrix as a tool of surveillance system that can examine the exposure and health status of semiconductor workers according to type of operation and type of job or task is recommended.

Suggested Citation

  • Sangjun Choi & Chungsik Yoon & Seungwon Kim & Won Kim & Kwonchul Ha & Jeeyeon Jeong & Jongcheul Kim & Jungah Shin & Donguk Park, 2018. "Comprehensive Evaluation of Hazardous Chemical Exposure Control System at a Semiconductor Manufacturing Company in South Korea," IJERPH, MDPI, vol. 15(6), pages 1-14, June.
    • Handle: RePEc:gam:jijerp:v:15:y:2018:i:6:p:1162-:d:150364
    as

    Download full text from publisher

    File URL: https://www.mdpi.com/1660-4601/15/6/1162/pdf
    Download Restriction: no
    File URL: https://www.mdpi.com/1660-4601/15/6/1162/
    Download Restriction: no
    ---><---

    References listed on IDEAS

    as
    1. Sangjun Choi & Wonseok Cha & Jihoon Park & Seungwon Kim & Won Kim & Chungsik Yoon & Ju-Hyun Park & Kwonchul Ha & Donguk Park, 2018. "Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers," IJERPH, MDPI, vol. 15(4), pages 1-14, March.
    Full references (including those not matched with items on IDEAS)

    Most related items

    These are the items that most often cite the same works as this one and are cited by the same works as this one.

      Corrections

      All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:gam:jijerp:v:15:y:2018:i:6:p:1162-:d:150364. See general information about how to correct material in RePEc.

      If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

      If CitEc recognized a bibliographic reference but did not link an item in RePEc to it, you can help with this form .

      If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

      For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: MDPI Indexing Manager (email available below). General contact details of provider: https://www.mdpi.com .

      Please note that corrections may take a couple of weeks to filter through the various RePEc services.

      IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.