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Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers

Author

Listed:
  • Sangjun Choi

    (Department of Occupational Health, Daegu Catholic University, Gyeongsan 38430, Korea)

  • Wonseok Cha

    (Department of Environmental Health, Korea National Open University, Seoul 03087, Korea)

  • Jihoon Park

    (Department of Environmental Health Sciences, Institute of Health and Environment, Graduate School of Public Health, Seoul National University, Seoul 08826, Korea)

  • Seungwon Kim

    (Department of Public Health, Keimyung University, Daegu 42601, Korea)

  • Won Kim

    (Wonjin Institute of Occupational and Environmental Health, Seoul 02221, Korea)

  • Chungsik Yoon

    (Department of Environmental Health Sciences, Institute of Health and Environment, Graduate School of Public Health, Seoul National University, Seoul 08826, Korea)

  • Ju-Hyun Park

    (Department of Statistics, Dongguk University, Seoul 04620, Korea)

  • Kwonchul Ha

    (Department of Biochemistry and Health Science, Changwon National University, Changwon 51140, Korea)

  • Donguk Park

    (Department of Environmental Health, Korea National Open University, Seoul 03087, Korea)

Abstract

We assessed the exposure of semiconductor workers to extremely low frequency-magnetic fields (ELF-MF) and identified job characteristics affecting ELF-MF exposure. These were demonstrated by assessing the exposure of 117 workers involved in wafer fabrication (fab) and chip packaging wearing personal dosimeters for a full shift. A portable device was used to monitor ELF-MF in high temporal resolution. All measurements were categorized by operation, job and working activity during working time. ELF-MF exposure of workers were classified based on the quartiles of ELF-MF distribution. The average levels of ELF-MF exposure were 0.56 µT for fab workers, 0.59 µT for chip packaging workers and 0.89 µT for electrical engineers, respectively. Exposure to ELF-MF differed among types of factory, operation, job and activity. Workers engaged in the diffusion and chip testing activities showed the highest ELF-MF exposure. The ELF-MF exposures of process operators were found to be higher than those of maintenance engineers, although peak exposure and/or patterns varied. The groups with the highest quartile ELF-MF exposure level are operators in diffusion, ion implantation, module and testing operations, and maintenance engineers in diffusion, module and testing operations. In conclusion, ELF-MF exposure among workers can be substantially affected by the type of operation and job, and the activity or location.

Suggested Citation

  • Sangjun Choi & Wonseok Cha & Jihoon Park & Seungwon Kim & Won Kim & Chungsik Yoon & Ju-Hyun Park & Kwonchul Ha & Donguk Park, 2018. "Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers," IJERPH, MDPI, vol. 15(4), pages 1-14, March.
    • Handle: RePEc:gam:jijerp:v:15:y:2018:i:4:p:642-:d:138985
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    References listed on IDEAS

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    1. Qingsong Chen & Li Lang & Wenzhe Wu & Guoyong Xu & Xiao Zhang & Tao Li & Hanlin Huang, 2013. "A Meta-Analysis on the Relationship between Exposure to ELF-EMFs and the Risk of Female Breast Cancer," PLOS ONE, Public Library of Science, vol. 8(7), pages 1-9, July.
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    Cited by:

    1. Sangjun Choi & Chungsik Yoon & Seungwon Kim & Won Kim & Kwonchul Ha & Jeeyeon Jeong & Jongcheul Kim & Jungah Shin & Donguk Park, 2018. "Comprehensive Evaluation of Hazardous Chemical Exposure Control System at a Semiconductor Manufacturing Company in South Korea," IJERPH, MDPI, vol. 15(6), pages 1-14, June.

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