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Disturbance Rejection Run-to-Run Controller for Semiconductor Manufacturing

In: Computational Intelligence and Optimization Methods for Control Engineering

Author

Listed:
  • Marzieh Khakifirooz

    (Tecnológico de Monterrey)

  • Mahdi Fathi

    (Mississippi State University)

  • Panos M. Pardalos

    (University of Florida)

Abstract

This chapter introduces a framework of disturbance rejection controller for discrete-time Run-to-Run (R2R) control system in semiconductor manufacturing environments. While we discussed the source of uncertainty and disturbance in wafer fabrication process, the photolithography process as one of the cutting-edge steps in wafer fabrication is selected for illustrating the power of disturbance rejection algorithm for compensating the misalignment. Along with this case study, some classification of disturbance rejection control algorithm with the structure of control plant is discussed.

Suggested Citation

  • Marzieh Khakifirooz & Mahdi Fathi & Panos M. Pardalos, 2019. "Disturbance Rejection Run-to-Run Controller for Semiconductor Manufacturing," Springer Optimization and Its Applications, in: Maude Josée Blondin & Panos M. Pardalos & Javier Sanchis Sáez (ed.), Computational Intelligence and Optimization Methods for Control Engineering, chapter 0, pages 301-319, Springer.
    • Handle: RePEc:spr:spochp:978-3-030-25446-9_13
    DOI: 10.1007/978-3-030-25446-9_13
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