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A Comparative Analysis of Career Growth Models in R&D Organizations

In: Technology Development

Author

Listed:
  • Sowmini Sengupta

    (Intel Corporation)

  • Jorge Garcia

    (Intel Corporation)

  • Nayem Rahman

    (Intel Corporation)

  • Daria Spatar

    (Portland State University)

Abstract

Firms that invest in developing cutting-edge technologies rely on leading technology practitioners to make innovations happen. These technology practitioners grow in their domain through continued discoveries which results in recognition of their work assessed through peer evaluations. These professional recognitions need to then translate into career growth for the practitioner within the firm in order for them to feel that their contributions are also valued by the company. Retaining technical talent is critical for the company in not only leveraging the skills of these individuals to achieve the company’s goals but these technology practitioners also serve as role models for other, newer members in the firm. This study analyses the various models that companies use to manage the career growth of these critical individuals. The study found four predominant career models from studying literature as well as in practice. Using this information, the study then selected five companies in various leading technical fields to understand their approach to technical career growth. Their characteristics such as size of the company, research investment, etc. and predominant career growth ladders were compared and contrasted. This study gives managers of leading technology firms some rich information on managing the individuals in their organization.

Suggested Citation

  • Sowmini Sengupta & Jorge Garcia & Nayem Rahman & Daria Spatar, 2014. "A Comparative Analysis of Career Growth Models in R&D Organizations," Innovation, Technology, and Knowledge Management, in: Tugrul U. Daim & Ramin Neshati & Russell Watt & James Eastham (ed.), Technology Development, edition 127, chapter 0, pages 233-249, Springer.
    • Handle: RePEc:spr:innchp:978-3-319-05651-7_12
    DOI: 10.1007/978-3-319-05651-7_12
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