Author
Listed:
- ŁUKASZ KACZMAREK
(Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź, Poland)
- PIOTR KULA
(Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź, Poland)
- TOMASZ WARGA
(Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź, Poland)
- ŁUKASZ KOŁODZIEJCZYK
(Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź, Poland)
- PETR LOUDA
(#x2020;Institute of Nanomaterials, Advanced Technology and Innovation, Technical University of Liberec, Studentská 2, 461-17 Liberec, Czech Republic)
- KAROLÍNA BORŮVKOVÁ
(#x2020;Institute of Nanomaterials, Advanced Technology and Innovation, Technical University of Liberec, Studentská 2, 461-17 Liberec, Czech Republic)
- PIOTR NIEDZIELSKI
(#x2020;Institute of Nanomaterials, Advanced Technology and Innovation, Technical University of Liberec, Studentská 2, 461-17 Liberec, Czech Republic)
- WITOLD SZYMAŃSKI
(Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź, Poland)
- LUKÁŠ VOLESKÝ
(#x2020;Institute of Nanomaterials, Advanced Technology and Innovation, Technical University of Liberec, Studentská 2, 461-17 Liberec, Czech Republic)
- WITOLD PAWŁOWSKI
(#x2021;Institute of Machine Tools and Production Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź Poland)
- PIOTR ZAWADZKI
(Institute of Materials Science and Engineering, Lodz University of Technology, Stefanowskiego 1/15, 90-924 Łódź, Poland)
Abstract
Herein, the results of a study focused on graphene in activation and cross-linking reactions with hydrazine are reported. The method provides an approach to the preparation of graphene-based materials, in this case, with a preset distance between individual layer and a relatively low ratio between the Raman G and D bands — D peak intensity/G peak intensity (ID/IG), ca. 1.81 (for unmodified High Strength Metallurgical Graphene® (HSMG® [Trade mark number: 013391669; Office for Harmonization in the Internal Market]), this ratio is 0.16). A 3D structure was created without a substrate (e.g. Si, SiO2 or polymer). This method allows for the preparation of a 3D graphene structure without the π–π interactions between individual layers.
Suggested Citation
Łukasz Kaczmarek & Piotr Kula & Tomasz Warga & Łukasz Kołodziejczyk & Petr Louda & Karolína Borůvková & Piotr Niedzielski & Witold Szymański & Lukáš Voleský & Witold Pawłowski & Piotr Zawadzki, 2019.
"Creation Of A 3d Structure Based On The High Strength Metallurgical Graphene®,"
Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 26(06), pages 1-8, July.
Handle:
RePEc:wsi:srlxxx:v:26:y:2019:i:06:n:s0218625x18502062
DOI: 10.1142/S0218625X18502062
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