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Effect Of Substrate Temperature On The Growth Of Copper Oxide Thin Films Deposited By Pulsed Laser Deposition Technique

Author

Listed:
  • MUHAMMAD KAIF SHABBIR

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan)

  • SHAZIA BASHIR

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan)

  • QAZI SALMAN AHMED

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan†Department of Electrical Engineering, Information Technology University, Lahore, Pakistan)

  • NAZISH YASEEN

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan)

  • SOHAIL ABDUL JALIL

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan†Department of Electrical Engineering, Information Technology University, Lahore, Pakistan)

  • MAHREEN AKRAM

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan)

  • KHALIQ MAHMOOD

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan)

  • AYESHA KHALID

    (Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan†Department of Electrical Engineering, Information Technology University, Lahore, Pakistan)

Abstract

The effect of substrate temperature on growth of pulsed laser deposited copper oxide thin films has been investigated by employing Nd: YAG laser (532nm, 6ns, 10Hz) irradiation at a fluence of 8.2J/cm2. XRD analysis reveals that copper oxide films deposited at room temperature are amorphous in nature, whereas films deposited at higher substrate temperatures are polycrystalline in nature. SEM and AFM analyses revealed that films deposited at substrate temperatures, ranging from room temperature to 300∘C are comprised of large sized clusters, islands and particulates, whereas uniform films with an appearance of granular morphology and distinct bump formation are grown at higher substrate temperatures of 400∘C and 500∘C. The optical bandgap of deposited films is evaluated by UV-VIS spectroscopy and shows a decreasing trend with increasing substrate temperature. Four point probe analysis reveals that electrical conductivity of the deposited films increases with increase in the substrate temperature, and is maximum for highest growth temperature of 500∘C. It is revealed that growth temperature plays a significant role for structure, texture, optical and electrical behavior of copper oxide thin films. The surface and structural properties of the deposited films are well correlated with their electrical and optical response.

Suggested Citation

  • Muhammad Kaif Shabbir & Shazia Bashir & Qazi Salman Ahmed & Nazish Yaseen & Sohail Abdul Jalil & Mahreen Akram & Khaliq Mahmood & Ayesha Khalid, 2018. "Effect Of Substrate Temperature On The Growth Of Copper Oxide Thin Films Deposited By Pulsed Laser Deposition Technique," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 25(02), pages 1-14, February.
    • Handle: RePEc:wsi:srlxxx:v:25:y:2018:i:02:n:s0218625x18500531
    DOI: 10.1142/S0218625X18500531
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