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STRUCTURAL PROPERTIES OFAlNFILMS WITH OXYGEN CONTENT DEPOSITED BY REACTIVE MAGNETRON SPUTTERING: XRD AND XPS CHARACTERIZATION

Author

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  • MANUEL GARCÍA-MÉNDEZ

    (Centro de Investigación en Ciencias Físico Matemáticas, Facultad de Ciencias Físico-Matemáticas de la UANL, Manuel L. Barragán S/N, Cd. Universitaria, San Nicolás de los Garza, N.L.C.P. 66450, Mexico;
    Centro de Innovación, Investigación y Desarrollo en Ingeniería y Tecnología-UANL, Km. 10 Nueva Carretera al Aeropuerto, Internacional de Monterrey, PIIT Monterrey, C.P. 66600, Apodaca, Nuevo León, Mexico)

  • SANTOS MORALES-RODRÍGUEZ

    (Facultad de Ingeniería Mecánica y Eléctrica de la UAC, avenida Barranquillas S/N Col. Guadalupe, C.P. 25750, Monclova, Coah, Mexico)

  • SADASIVAN SHAJI

    (Facultad de Ingeniería Mecánica y Eléctrica de la UANL, Manuel L. Barragán S/N, Cd. Universitaria, San Nicolás de los Garza, N.L.C.P. 66450, Mexico;
    Centro de Innovación, Investigación y Desarrollo en Ingeniería y Tecnología-UANL, Km. 10 Nueva Carretera al Aeropuerto, Internacional de Monterrey, PIIT Monterrey, C.P. 66600, Apodaca, Nuevo León, Mexico)

  • BINDU KRISHNAN

    (Facultad de Ingeniería Mecánica y Eléctrica de la UANL, Manuel L. Barragán S/N, Cd. Universitaria, San Nicolás de los Garza, N.L.C.P. 66450, Mexico;
    Centro de Innovación, Investigación y Desarrollo en Ingeniería y Tecnología-UANL, Km. 10 Nueva Carretera al Aeropuerto, Internacional de Monterrey, PIIT Monterrey, C.P. 66600, Apodaca, Nuevo León, Mexico)

  • PASCUAL BARTOLO-PÉREZ

    (Cinvestav-IPN, Unidad Méridaî, Departamento de Física Aplicadaî, Km. 6 Antigua Carr. a Progreso, C.P. 97310 Mérida, Yuc., Mexico)

Abstract

A set of aluminium nitride(AlN)and oxidizedAlN(AlNO)thin films were grown with the technique of direct current (dc) reactive magnetron sputtering. The main purpose of this investigation is to explore the influence of the oxygen on the structural properties ofAlNandAlNOfilms. The crystalline properties and chemical identification of phases were studied by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. Electrical properties were analyzed from I-V measurements. It was found that films crystallized under theAlNwürzite structure and presented a polycrystalline preferential growth along [0001] direction, perpendicular to substrate. Small amounts of secondary aluminium oxide phases were detected too. The oxide phases can induce defects, which can alter crystallinity of films.

Suggested Citation

  • Manuel García-Méndez & Santos Morales-Rodríguez & Sadasivan Shaji & Bindu Krishnan & Pascual Bartolo-Pérez, 2011. "STRUCTURAL PROPERTIES OFAlNFILMS WITH OXYGEN CONTENT DEPOSITED BY REACTIVE MAGNETRON SPUTTERING: XRD AND XPS CHARACTERIZATION," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 18(01n02), pages 23-31.
    • Handle: RePEc:wsi:srlxxx:v:18:y:2011:i:01n02:n:s0218625x1101445x
    DOI: 10.1142/S0218625X1101445X
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    1. Blatz, Perry K., 2006. "The Face of Decline: The Pennsylvania Anthracite Region in the Twentieth Century. By Thomas Dublin and Walter Licht. Ithaca: Cornell University Press, 2005. x + 275 pp. Illustrations, maps, figures, a," Business History Review, Cambridge University Press, vol. 80(3), pages 555-557, October.
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