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Development of a Novel Instrument for X-Ray Photoelectron Diffraction and Holography

Author

Listed:
  • Hideshi Ishii

    (Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • Susumu Shiraki

    (Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • Keiji Tamura

    (Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • Wei-Guo Chu

    (Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan)

  • Masanori Owari

    (Environmental Science Center, the University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan)

  • Ryuichi Shimizu

    (Faculty of Information Science, Osaka Institute of Technology, 1-79-1 Kitayama, Hirakata, Osaka 573-0196, Japan)

  • Yoshimasa Nihei

    (Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan)

Abstract

For X-ray photoelectron diffraction (XPED) and holography measurements we developed a novel laboratory instrument with the multienergy high power X-ray source and the high energy and high angular resolution photoelectron spectrometer system. The photon intensities of Al–Kα, Cr–Lα and Cu–Kα were estimated at 4.6 × 1011cps, 7.5 × 1010cps and 7.2 × 1010cps, respectively. Ag3d XPS also revealed that the energy resolutions of Al–Kα and Cr–Lα sources were 0.9 eV and 3.1 eV, respectively. XPS and XPED ofh-BN/Ni(111) excited by Al–Kα and Cr–Lα elucidated the potential and the validity of the XPED and holography analysis by using this novel instrument. Cu–Kα excitation XPS and Ti1s XPED measurements of the SrTiO3(001) surface have also been performed.

Suggested Citation

  • Hideshi Ishii & Susumu Shiraki & Keiji Tamura & Wei-Guo Chu & Masanori Owari & Ryuichi Shimizu & Yoshimasa Nihei, 2003. "Development of a Novel Instrument for X-Ray Photoelectron Diffraction and Holography," Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 10(02n03), pages 505-510.
    • Handle: RePEc:wsi:srlxxx:v:10:y:2003:i:02n03:n:s0218625x03005207
    DOI: 10.1142/S0218625X03005207
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