Author
Listed:
- G. B. ZHANG
(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China)
- H. J. ZHOU
(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China)
- C. S. SHI
(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China)
- J. Y. SHI
(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China)
- Y. X. ZHOU
(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China)
- X. Y. ZHANG
(National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, P. R. China)
- Z. X. FU
(Department of Physics, University of Science and Technology of China, Hefei 230026, P. R. China)
- M. KIRM
(II. Institut für Experimental Physik der Universität Hamburg, Germany)
- G. ZIMMERER
(II. Institut für Experimental Physik der Universität Hamburg, Germany)
Abstract
The emission properties of ZnO films deposited on Si substrates by reactive dc sputtering have been studied using synchrotron radiation (SR). The integrated luminescence spectra as well as the spectra at a fast time window from about 4 ns to 8 ns and a slow time window from about 20 ns to 160 ns were measured simultaneously, at a temperature range from several K to 300 K. Apart from the bound-exciton radiation recombination (peaked at 369.5 nm) and ultraviolet emission band (peaked at 380 nm), a new emission band peaked at 290 nm was found for the first time under SR vacuum ultraviolet excitation. The mechanisms of these photoluminescence emissions are discussed.
Suggested Citation
G. B. Zhang & H. J. Zhou & C. S. Shi & J. Y. Shi & Y. X. Zhou & X. Y. Zhang & Z. X. Fu & M. Kirm & G. Zimmerer, 2002.
"TEMPERATURE AND TIME DEPENDENCE OF EMISSION PROPERTIES OF ZnO FILMS DEPOSITED ON SiSUBSTRATES,"
Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 9(02), pages 699-703.
Handle:
RePEc:wsi:srlxxx:v:09:y:2002:i:02:n:s0218625x02002865
DOI: 10.1142/S0218625X02002865
Download full text from publisher
As the access to this document is restricted, you may want to search for a different version of it.
Corrections
All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:wsi:srlxxx:v:09:y:2002:i:02:n:s0218625x02002865. See general information about how to correct material in RePEc.
If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.
We have no bibliographic references for this item. You can help adding them by using this form .
If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.
For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Tai Tone Lim (email available below). General contact details of provider: http://www.worldscinet.com/srl/srl.shtml .
Please note that corrections may take a couple of weeks to filter through
the various RePEc services.