Author
Listed:
- H. J. SHIN
(Beamline Department, Pohang Accelerator Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea;
Physics Department, POSTECH, Pohang, 790-784, Korea)
- M. K LEE
(Beamline Department, Pohang Accelerator Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea)
- C. C. HWANG
(Beamline Department, Pohang Accelerator Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea)
- K. J. KIM
(Beamline Department, Pohang Accelerator Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea)
- T.-H. KANG
(Beamline Department, Pohang Accelerator Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea)
- B. KIM
(Beamline Department, Pohang Accelerator Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea;
Physics Department, POSTECH, Pohang, 790-784, Korea)
- G. B. KIM
(Physics Department, POSTECH, Pohang, 790-784, Korea)
- C. K. HONG
(Physics Department, POSTECH, Pohang, 790-784, Korea)
- K. W. LEE
(Physics Department, Kongju National University, Kongju, Chungnam, 314-701, Korea)
- Y. Y. KIM
(Physics Department, Kongju National University, Kongju, Chungnam, 314-701, Korea)
Abstract
The changes of the structure and chemical states of photoluminescent p-type porous silicon (PS) caused by annealing in vacuum were investigated with atomic force microscopy and X-ray photoemission spectroscopy. The relative intensities of the silicon dioxide and suboxide peaks increased with the annealing temperature. The average size of the fine crystallites of the as-prepared samples was 5–10 nm and became 50–100 nm after being annealed at 550°C. The cause of photoluminescence quenching upon annealing is discussed.
Suggested Citation
H. J. Shin & M. K Lee & C. C. Hwang & K. J. Kim & T.-H. Kang & B. Kim & G. B. Kim & C. K. Hong & K. W. Lee & Y. Y. Kim, 2002.
"THE EFFECTS OF ANNEALING OF Ap-TYPE PHOTOLUMINESCENT POROUS SILICON IN VACUUM,"
Surface Review and Letters (SRL), World Scientific Publishing Co. Pte. Ltd., vol. 9(01), pages 261-265.
Handle:
RePEc:wsi:srlxxx:v:09:y:2002:i:01:n:s0218625x02002166
DOI: 10.1142/S0218625X02002166
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