IDEAS home Printed from https://ideas.repec.org/a/taf/uiiexx/v44y2012i7p580-589.html
   My bibliography  Save this article

Robust parameter design for multiple-stage nanomanufacturing

Author

Listed:
  • Chumpol Yuangyai
  • Harriet Nembhard
  • Gregory Hayes
  • James Adair

Abstract

Process reproducibility is a major concern for scientists and engineers, especially when new processes or new products are transitioned from laboratory-scale to full-scale manufacturing. Robust Parameter Design (RPD) is often used to mitigate this problem. However, in multiple-stage manufacturing process environments, it is difficult to employ the RPD concept because experiments cannot strictly follow the principle of complete randomization. Furthermore, the stages can be located at different sites, leading to multiple sets of noise factors. In the existing literature, only a single set of noise factors is considered. Therefore, in this research, the foundation of using the RPD concept with multistage experiments is developed and discussed. Some optimal design catalogs are provided based on a modified minimum aberration criterion. The context for this work is the development of a medical device made of nanoscale composites using a multiple-stage manufacturing process.

Suggested Citation

  • Chumpol Yuangyai & Harriet Nembhard & Gregory Hayes & James Adair, 2012. "Robust parameter design for multiple-stage nanomanufacturing," IISE Transactions, Taylor & Francis Journals, vol. 44(7), pages 580-589.
  • Handle: RePEc:taf:uiiexx:v:44:y:2012:i:7:p:580-589
    DOI: 10.1080/0740817X.2011.635176
    as

    Download full text from publisher

    File URL: http://hdl.handle.net/10.1080/0740817X.2011.635176
    Download Restriction: Access to full text is restricted to subscribers.

    File URL: https://libkey.io/10.1080/0740817X.2011.635176?utm_source=ideas
    LibKey link: if access is restricted and if your library uses this service, LibKey will redirect you to where you can use your library subscription to access this item
    ---><---

    As the access to this document is restricted, you may want to search for a different version of it.

    More about this item

    Statistics

    Access and download statistics

    Corrections

    All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:taf:uiiexx:v:44:y:2012:i:7:p:580-589. See general information about how to correct material in RePEc.

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    We have no bibliographic references for this item. You can help adding them by using this form .

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Chris Longhurst (email available below). General contact details of provider: http://www.tandfonline.com/uiie .

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.