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Sequential venous anastomosis design to enhance patency of arterio-venous grafts for hemodialysis

Author

Listed:
  • Foad Kabinejadian
  • Boyang Su
  • Dhanjoo N. Ghista
  • Munirah Ismail
  • Sangho Kim
  • Hwa Liang Leo

Abstract

Arterio-venous grafts (AVGs), the second best option as long-term vascular access for hemodialysis, face major issues of stenosis mainly due to development of intimal hyperplasia at the venous anastomosis which is linked to unfavorable hemodynamic conditions. We have investigated computationally the utility of a coupled sequential venous anastomotic design to replace conventional end-to-side (ETS) venous anastomosis, in order to improve the hemodynamic environment and consequently enhance the patency of AVGs. Two complete vascular access models with the conventional and the proposed venous anastomosis configurations were constructed. Three-dimensional, pulsatile blood flow through the models was simulated, and wall shear stress (WSS)-based hemodynamic parameters were calculated and compared between the two models. Simulation results demonstrated that the proposed anastomotic design provides: (i) a more uniform and smooth flow at the ETS anastomosis, without flow impingement and stagnation point on the artery bed and vortex formation in the heel region of the ETS anastomosis; (ii) more uniform distribution of WSS and substantially lower WSS gradients on the venous wall; and (iii) a spare route for the blood flow to the vein, to avoid re-operation in case of stenosis. The distinctive hemodynamic advantages observed in the proposed anastomotic design can enhance the patency of AVGs.

Suggested Citation

  • Foad Kabinejadian & Boyang Su & Dhanjoo N. Ghista & Munirah Ismail & Sangho Kim & Hwa Liang Leo, 2017. "Sequential venous anastomosis design to enhance patency of arterio-venous grafts for hemodialysis," Computer Methods in Biomechanics and Biomedical Engineering, Taylor & Francis Journals, vol. 20(1), pages 85-93, January.
  • Handle: RePEc:taf:gcmbxx:v:20:y:2017:i:1:p:85-93
    DOI: 10.1080/10255842.2016.1200564
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