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The Correction of Eye Blink Artefacts in the EEG: A Comparison of Two Prominent Methods

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  • Sven Hoffmann
  • Michael Falkenstein

Abstract

Background: The study investigated the residual impact of eyeblinks on the electroencephalogram (EEG) after application of different correction procedures, namely a regression method (eye movement correction procedure, EMCP) and a component based method (Independent Component Analysis, ICA). Methodology/Principle Findings: Real and simulated data were investigated with respect to blink-related potentials and the residual mutual information of uncorrected vertical electrooculogram (EOG) and corrected EEG, which is a measure of residual EOG contribution to the EEG. The results reveal an occipital positivity that peaks at about 250ms after the maximum blink excursion following application of either correction procedure. This positivity was not observable in the simulated data. Mutual information of vertical EOG and EEG depended on the applied regression procedure. In addition, different correction results were obtained for real and simulated data. ICA yielded almost perfect correction in all conditions. However, under certain conditions EMCP yielded comparable results to the ICA approach. Conclusion: In conclusion, for EMCP the quality of correction depended on the EMCP variant used and the structure of the data, whereas ICA always yielded almost perfect correction. However, its disadvantage is the much more complex data processing, and that it requires a suitable amount of data.

Suggested Citation

  • Sven Hoffmann & Michael Falkenstein, 2008. "The Correction of Eye Blink Artefacts in the EEG: A Comparison of Two Prominent Methods," PLOS ONE, Public Library of Science, vol. 3(8), pages 1-11, August.
  • Handle: RePEc:plo:pone00:0003004
    DOI: 10.1371/journal.pone.0003004
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    Cited by:

    1. Arnaud Delorme & Jason Palmer & Julie Onton & Robert Oostenveld & Scott Makeig, 2012. "Independent EEG Sources Are Dipolar," PLOS ONE, Public Library of Science, vol. 7(2), pages 1-14, February.

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