Author
Listed:
- Jun Luo
(Beijing National Center for Electron Microscopy, Laboratory of Advanced Materials, Tsinghua University)
- Peisen Li
(Tsinghua University)
- Sen Zhang
(Tsinghua University)
- Hongyu Sun
(Beijing National Center for Electron Microscopy, Laboratory of Advanced Materials, Tsinghua University)
- Hongping Yang
(Beijing National Center for Electron Microscopy, Laboratory of Advanced Materials, Tsinghua University)
- Yonggang Zhao
(Tsinghua University)
Abstract
Arising from C. H. Wan, X. Z. Zhang, X. L. Gao, J. M. Wang & X. Y. Tan Nature 477, 304–307 (2011).10.1038/nature10375 Magnetoresistance exhibited by non-magnetic semiconductors has attracted much attention1,2,3,4,5,6,7,8,9,10,11,12,13. In particular, Wan et al. reported room-temperature magnetoresistance in silicon to reach 10% at 0.07 T and 150,000% at 7 T—“an intrinsically spatial effect”12. Their supply voltage was approximately 10 V (ref. 12), which is low and approaches the industrial requirement14. However, we have found their large magnetoresistance values to be experimental artefacts caused by their method of measurement. The true room-temperature magnetoresistance of the devices described in ref. 12 is low with a magnetic field of up to 7 T and a supply voltage of around 10 V and hence these devices cannot offer large magnetoresistance with low supply voltage to industry. There is a Reply to this Brief Communication Arising by Zhang, X. Z., Wan, C. H., Gao, X. L., Wang, J. M. & Tan, X. Y. Nature 501, http://dx.doi.org/10.1038/nature12590 (2013).
Suggested Citation
Jun Luo & Peisen Li & Sen Zhang & Hongyu Sun & Hongping Yang & Yonggang Zhao, 2013.
"Low-voltage magnetoresistance in silicon,"
Nature, Nature, vol. 501(7468), pages 1-1, September.
Handle:
RePEc:nat:nature:v:501:y:2013:i:7468:d:10.1038_nature12589
DOI: 10.1038/nature12589
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