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Pushing the limits of lithography

Author

Listed:
  • Takashi Ito

    (Fujitsu Laboratories Ltd)

  • Shinji Okazaki

    (Association of Super Advanced Electronics Technologies)

Abstract

The phenomenal rate of increase in the integration density of silicon chips has been sustained in large part by advances in optical lithography — the process that patterns and guides the fabrication of the component semiconductor devices and circuitry. Although the introduction of shorter-wavelength light sources and resolution-enhancement techniques should help maintain the current rate of device miniaturization for several more years, a point will be reached where optical lithography can no longer attain the required feature sizes. Several alternative lithographic techniques under development have the capability to overcome these resolution limits but, at present, no obvious successor to optical lithography has emerged.

Suggested Citation

  • Takashi Ito & Shinji Okazaki, 2000. "Pushing the limits of lithography," Nature, Nature, vol. 406(6799), pages 1027-1031, August.
  • Handle: RePEc:nat:nature:v:406:y:2000:i:6799:d:10.1038_35023233
    DOI: 10.1038/35023233
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    Cited by:

    1. Seongheon Baek & Hyeong Woo Ban & Sanggyun Jeong & Seung Hwae Heo & Da Hwi Gu & Wooyong Choi & Seungjun Choo & Yae Eun Park & Jisu Yoo & Moon Kee Choi & Jiseok Lee & Jae Sung Son, 2022. "Generalised optical printing of photocurable metal chalcogenides," Nature Communications, Nature, vol. 13(1), pages 1-11, December.

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