Author
Listed:
- Mamoru Yoshimoto
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Kenji Yoshida
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Hideaki Maruta
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Yoshiko Hishitani
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Hideomi Koinuma
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Shigeru Nishio
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Masato Kakihana
(Materials and Structures Laboratory, Tokyo Institute of Technology)
- Takeshi Tachibana
(Electronics & Information Technology Laboratory, Kobe Steel Ltd. Takatsukadai)
Abstract
Thin films of diamond are of interest for technological applications such as hard coatings, heat sinks in electronic devices and miniaturized vacuum diodes1,2,3,4. They are typically produced by chemical vapour deposition, and the presence of atomic hydrogen has been considered crucial for the growth of the diamond crystals5,6,7,8,9. Some studies have claimed diamond film growth in a hydrogen-free environment10,11,12,13, but questions remained about the growth conditions in those cases. Here we report the nucleation and growth of diamond by vapour deposition in a hydrogen-free, pure oxygen environment to form crystals that are heteroepitaxially aligned on a single-crystal sapphire substrate. In other words, we are able to achieve diamond growth under conditions where the oxidative ‘etching’ of carbon must compete with its deposition. By choosing a temperature range that results in preferential oxidation of non-diamond (graphitic) carbon species to that of diamond, we are able to achieve the accumulation of diamond.
Suggested Citation
Mamoru Yoshimoto & Kenji Yoshida & Hideaki Maruta & Yoshiko Hishitani & Hideomi Koinuma & Shigeru Nishio & Masato Kakihana & Takeshi Tachibana, 1999.
"Epitaxial diamond growth on sapphire in an oxidizing environment,"
Nature, Nature, vol. 399(6734), pages 340-342, May.
Handle:
RePEc:nat:nature:v:399:y:1999:i:6734:d:10.1038_20653
DOI: 10.1038/20653
Download full text from publisher
As the access to this document is restricted, you may want to search for a different version of it.
Corrections
All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:nat:nature:v:399:y:1999:i:6734:d:10.1038_20653. See general information about how to correct material in RePEc.
If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.
We have no bibliographic references for this item. You can help adding them by using this form .
If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.
For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Sonal Shukla or Springer Nature Abstracting and Indexing (email available below). General contact details of provider: http://www.nature.com .
Please note that corrections may take a couple of weeks to filter through
the various RePEc services.