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Taming contact line instability for pattern formation

Author

Listed:
  • A. Deblais

    (LOMA, Laboratoire Ondes et Matiere d’Aquitaine (UMR 5798), Universite de Bordeaux—CNRS)

  • R. Harich

    (LOMA, Laboratoire Ondes et Matiere d’Aquitaine (UMR 5798), Universite de Bordeaux—CNRS)

  • A. Colin

    (ESPCI, CNRS, SIMM UMR 7615)

  • H. Kellay

    (LOMA, Laboratoire Ondes et Matiere d’Aquitaine (UMR 5798), Universite de Bordeaux—CNRS)

Abstract

Coating surfaces with different fluids is prone to instability producing inhomogeneous films and patterns. The contact line between the coating fluid and the surface to be coated is host to different instabilities, limiting the use of a variety of coating techniques. Here we take advantage of the instability of a receding contact line towards cusp and droplet formation to produce linear patterns of variable spacings. We stabilize the instability of the cusps towards droplet formation by using polymer solutions that inhibit this secondary instability and give rise to long slender cylindrical filaments. We vary the speed of deposition to change the spacing between these filaments. The combination of the two gives rise to linear patterns into which different colloidal particles can be embedded, long DNA molecules can be stretched and particles filtered by size. The technique is therefore suitable to prepare anisotropic structures with variable properties.

Suggested Citation

  • A. Deblais & R. Harich & A. Colin & H. Kellay, 2016. "Taming contact line instability for pattern formation," Nature Communications, Nature, vol. 7(1), pages 1-7, November.
    • Handle: RePEc:nat:natcom:v:7:y:2016:i:1:d:10.1038_ncomms12458
    DOI: 10.1038/ncomms12458
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