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Ultra-high modulation depth exceeding 2,400% in optically controlled topological surface plasmons

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  • Sangwan Sim

    (School of Electrical and Electronic Engineering, Yonsei University)

  • Houk Jang

    (School of Electrical and Electronic Engineering, Yonsei University)

  • Nikesh Koirala

    (Rutgers, The State University of New Jersey)

  • Matthew Brahlek

    (Rutgers, The State University of New Jersey)

  • Jisoo Moon

    (Rutgers, The State University of New Jersey)

  • Ji Ho Sung

    (Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang University of Science and Technology (POSTECH)
    Pohang University of Science and Technology (POSTECH))

  • Jun Park

    (School of Electrical and Electronic Engineering, Yonsei University)

  • Soonyoung Cha

    (School of Electrical and Electronic Engineering, Yonsei University)

  • Seongshik Oh

    (Rutgers, The State University of New Jersey
    Institute for Advanced Materials, Devices and Nanotechnology, Rutgers, The State University of New Jersey)

  • Moon-Ho Jo

    (Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang University of Science and Technology (POSTECH)
    Pohang University of Science and Technology (POSTECH)
    Pohang University of Science and Technology (POSTECH))

  • Jong-Hyun Ahn

    (School of Electrical and Electronic Engineering, Yonsei University)

  • Hyunyong Choi

    (School of Electrical and Electronic Engineering, Yonsei University)

Abstract

Modulating light via coherent charge oscillations in solids is the subject of intense research topics in opto-plasmonics. Although a variety of methods are proposed to increase such modulation efficiency, one central challenge is to achieve a high modulation depth (defined by a ratio of extinction with/without light) under small photon-flux injection, which becomes a fundamental trade-off issue both in metals and semiconductors. Here, by fabricating simple micro-ribbon arrays of topological insulator Bi2Se3, we report an unprecedentedly large modulation depth of 2,400% at 1.5 THz with very low optical fluence of 45 μJ cm−2. This was possible, first because the extinction spectrum is nearly zero due to the Fano-like plasmon–phonon-destructive interference, thereby contributing an extremely small denominator to the extinction ratio. Second, the numerator of the extinction ratio is markedly increased due to the photoinduced formation of massive two-dimensional electron gas below the topological surface states, which is another contributor to the ultra-high modulation depth.

Suggested Citation

  • Sangwan Sim & Houk Jang & Nikesh Koirala & Matthew Brahlek & Jisoo Moon & Ji Ho Sung & Jun Park & Soonyoung Cha & Seongshik Oh & Moon-Ho Jo & Jong-Hyun Ahn & Hyunyong Choi, 2015. "Ultra-high modulation depth exceeding 2,400% in optically controlled topological surface plasmons," Nature Communications, Nature, vol. 6(1), pages 1-7, December.
  • Handle: RePEc:nat:natcom:v:6:y:2015:i:1:d:10.1038_ncomms9814
    DOI: 10.1038/ncomms9814
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