Author
Listed:
- Benjamin Bein
(Stony Brook University)
- Hsiang-Chun Hsing
(Stony Brook University)
- Sara J. Callori
(Stony Brook University
Present address: Department of Physics, California State University, San Bernardino, 5500 University Parkway, San Bernardino, California 92407-2393, USA)
- John Sinsheimer
(Stony Brook University
Present address: Brookhaven National Laboratory, Upton, New York 11973-5000, USA)
- Priya V. Chinta
(Cook Physical Science Building, University of Vermont)
- Randall L. Headrick
(Cook Physical Science Building, University of Vermont)
- Matthew Dawber
(Stony Brook University)
Abstract
In epitaxially strained ferroelectric thin films and superlattices, the ferroelectric transition temperature can lie above the growth temperature. Ferroelectric polarization and domains should then evolve during the growth of a sample, and electrostatic boundary conditions may play an important role. In this work, ferroelectric domains, surface termination, average lattice parameter and bilayer thickness are simultaneously monitored using in situ synchrotron X-ray diffraction during the growth of BaTiO3/SrTiO3 superlattices on SrTiO3 substrates by off-axis radio frequency magnetron sputtering. The technique used allows for scan times substantially faster than the growth of a single layer of material. Effects of electric boundary conditions are investigated by growing the same superlattice alternatively on SrTiO3 substrates and 20 nm SrRuO3 thin films on SrTiO3 substrates. These experiments provide important insights into the formation and evolution of ferroelectric domains when the sample is ferroelectric during the growth process.
Suggested Citation
Benjamin Bein & Hsiang-Chun Hsing & Sara J. Callori & John Sinsheimer & Priya V. Chinta & Randall L. Headrick & Matthew Dawber, 2015.
"In situ X-ray diffraction and the evolution of polarization during the growth of ferroelectric superlattices,"
Nature Communications, Nature, vol. 6(1), pages 1-8, December.
Handle:
RePEc:nat:natcom:v:6:y:2015:i:1:d:10.1038_ncomms10136
DOI: 10.1038/ncomms10136
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