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Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves

Author

Listed:
  • Xiaoshu Chen

    (University of Minnesota)

  • Hyeong-Ryeol Park

    (Seoul National University)

  • Matthew Pelton

    (Center for Nanoscale Materials, Argonne National Laboratory)

  • Xianji Piao

    (Photonic Systems Laboratory, School of EECS, Seoul National University)

  • Nathan C. Lindquist

    (University of Minnesota)

  • Hyungsoon Im

    (University of Minnesota)

  • Yun Jung Kim

    (Photonic Systems Laboratory, School of EECS, Seoul National University)

  • Jae Sung Ahn

    (Seoul National University)

  • Kwang Jun Ahn

    (Seoul National University)

  • Namkyoo Park

    (Photonic Systems Laboratory, School of EECS, Seoul National University)

  • Dai-Sik Kim

    (Seoul National University)

  • Sang-Hyun Oh

    (University of Minnesota)

Abstract

Squeezing light through nanometre-wide gaps in metals can lead to extreme field enhancements, nonlocal electromagnetic effects and light-induced electron tunnelling. This intriguing regime, however, has not been readily accessible to experimentalists because of the lack of reliable technology to fabricate uniform nanogaps with atomic-scale resolution and high throughput. Here we introduce a new patterning technology based on atomic layer deposition and simple adhesive-tape-based planarization. Using this method, we create vertically oriented gaps in opaque metal films along the entire contour of a millimetre-sized pattern, with gap widths as narrow as 9.9 Å, and pack 150,000 such devices on a 4-inch wafer. Electromagnetic waves pass exclusively through the nanogaps, enabling background-free transmission measurements. We observe resonant transmission of near-infrared waves through 1.1-nm-wide gaps (λ/1,295) and measure an effective refractive index of 17.8. We also observe resonant transmission of millimetre waves through 1.1-nm-wide gaps (λ/4,000,000) and infer an unprecedented field enhancement factor of 25,000.

Suggested Citation

  • Xiaoshu Chen & Hyeong-Ryeol Park & Matthew Pelton & Xianji Piao & Nathan C. Lindquist & Hyungsoon Im & Yun Jung Kim & Jae Sung Ahn & Kwang Jun Ahn & Namkyoo Park & Dai-Sik Kim & Sang-Hyun Oh, 2013. "Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves," Nature Communications, Nature, vol. 4(1), pages 1-7, December.
    • Handle: RePEc:nat:natcom:v:4:y:2013:i:1:d:10.1038_ncomms3361
    DOI: 10.1038/ncomms3361
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    Cited by:

    1. Yixian Gao & Peijun Li & Xiaokai Yuan, 2021. "Electromagnetic field enhancement in a subwavelength rectangular open cavity," Partial Differential Equations and Applications, Springer, vol. 2(4), pages 1-51, August.

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