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Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography

Author

Listed:
  • S.W. Schmucker

    (University of Illinois at Urbana-Champaign
    Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign)

  • N. Kumar

    (University of Illinois at Urbana-Champaign)

  • J.R. Abelson

    (University of Illinois at Urbana-Champaign)

  • S.R. Daly

    (University of Illinois at Urbana-Champaign)

  • G.S. Girolami

    (Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign
    University of Illinois at Urbana-Champaign)

  • M.R. Bischof

    (University of North Texas)

  • D.L. Jaeger

    (University of North Texas)

  • R.F. Reidy

    (University of North Texas)

  • B.P. Gorman

    (Colorado School of Mines)

  • J. Alexander

    (Zyvex Labs LLC)

  • J.B. Ballard

    (Zyvex Labs LLC)

  • J.N. Randall

    (Zyvex Labs LLC)

  • J.W. Lyding

    (University of Illinois at Urbana-Champaign
    Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign)

Abstract

Fabrication of ultrasharp probes is of interest for many applications, including scanning probe microscopy and electron-stimulated patterning of surfaces. These techniques require reproducible ultrasharp metallic tips, yet the efficient and reproducible fabrication of these consumable items has remained an elusive goal. Here we describe a novel biased-probe field-directed sputter sharpening technique applicable to conductive materials, which produces nanometer and sub-nanometer sharp W, Pt-Ir and W-HfB2 tips able to perform atomic-scale lithography on Si. Compared with traditional probes fabricated by etching or conventional sputter erosion, field-directed sputter sharpened probes have smaller radii and produce lithographic patterns 18–26% sharper with atomic-scale lithographic fidelity.

Suggested Citation

  • S.W. Schmucker & N. Kumar & J.R. Abelson & S.R. Daly & G.S. Girolami & M.R. Bischof & D.L. Jaeger & R.F. Reidy & B.P. Gorman & J. Alexander & J.B. Ballard & J.N. Randall & J.W. Lyding, 2012. "Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography," Nature Communications, Nature, vol. 3(1), pages 1-8, January.
    • Handle: RePEc:nat:natcom:v:3:y:2012:i:1:d:10.1038_ncomms1907
    DOI: 10.1038/ncomms1907
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    Cited by:

    1. S. E. Ammerman & V. Jelic & Y. Wei & V. N. Breslin & M. Hassan & N. Everett & S. Lee & Q. Sun & C. A. Pignedoli & P. Ruffieux & R. Fasel & T. L. Cocker, 2021. "Lightwave-driven scanning tunnelling spectroscopy of atomically precise graphene nanoribbons," Nature Communications, Nature, vol. 12(1), pages 1-9, December.

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