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Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition

Author

Listed:
  • Jinyang Zhao

    (Southern University of Science and Technology
    Peking University
    Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd)

  • Lixuan Chen

    (Southern University of Science and Technology
    Peking University
    Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd)

  • Dongze Li

    (Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd)

  • Zhiqing Shi

    (Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd)

  • Pai Liu

    (Southern University of Science and Technology)

  • Zhenlei Yao

    (TCL Research, 1001 Zhongshan Park Road, Nanshan District)

  • Hongcheng Yang

    (Southern University of Science and Technology
    Shenzhen Planck Innovation Technologies Co. Ltd)

  • Taoyu Zou

    (Peking University)

  • Bin Zhao

    (Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd)

  • Xin Zhang

    (Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd)

  • Hang Zhou

    (Peking University)

  • Yixing Yang

    (TCL Research, 1001 Zhongshan Park Road, Nanshan District)

  • Weiran Cao

    (Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd
    TCL Research, 1001 Zhongshan Park Road, Nanshan District)

  • Xiaolin Yan

    (TCL Research, 1001 Zhongshan Park Road, Nanshan District)

  • Shengdong Zhang

    (Peking University)

  • Xiao Wei Sun

    (Southern University of Science and Technology
    Shenzhen Planck Innovation Technologies Co. Ltd)

Abstract

Colloidal quantum dot (QD) emitters show great promise in the development of next-generation displays. Although various solution-processed techniques have been developed for nanomaterials, high-resolution and uniform patterning technology amicable to manufacturing is still missing. Here, we present large-area, high-resolution, full-color QD patterning utilizing a selective electrophoretic deposition (SEPD) technique. This technique utilizes photolithography combined with SEPD to achieve uniform and fast fabrication, low-cost QD patterning in large-area beyond 1,000 pixels-per-inch. The QD patterns only deposited on selective electrodes with precisely controlled thickness in a large range, which could cater for various optoelectronic devices. The adjustable surface morphology, packing density and refractive index of QD films enable higher efficiency compared to conventional solution-processed methods. We further demonstrate the versatility of our approach to integrate various QDs into large-area arrays of full-color emitting pixels and QLEDs with good performance. The results suggest a manufacture-viable technology for commercialization of QD-based displays.

Suggested Citation

  • Jinyang Zhao & Lixuan Chen & Dongze Li & Zhiqing Shi & Pai Liu & Zhenlei Yao & Hongcheng Yang & Taoyu Zou & Bin Zhao & Xin Zhang & Hang Zhou & Yixing Yang & Weiran Cao & Xiaolin Yan & Shengdong Zhang , 2021. "Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition," Nature Communications, Nature, vol. 12(1), pages 1-8, December.
  • Handle: RePEc:nat:natcom:v:12:y:2021:i:1:d:10.1038_s41467-021-24931-x
    DOI: 10.1038/s41467-021-24931-x
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    Cited by:

    1. Xiaoli He & Hongri Gu & Yanmei Ma & Yuhang Cai & Huaide Jiang & Yi Zhang & Hanhan Xie & Ming Yang & Xinjian Fan & Liang Guo & Zhan Yang & Chengzhi Hu, 2024. "Light patterning semiconductor nanoparticles by modulating surface charges," Nature Communications, Nature, vol. 15(1), pages 1-14, December.

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