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Heteroepitaxial vertical perovskite hot-electron transistors down to the monolayer limit

Author

Listed:
  • Brian S. Y. Kim

    (Stanford University
    Stanford University)

  • Yasuyuki Hikita

    (SLAC National Accelerator Laboratory)

  • Takeaki Yajima

    (The University of Tokyo)

  • Harold Y. Hwang

    (Stanford University
    SLAC National Accelerator Laboratory)

Abstract

Two-dimensional heterostructures combined with vertical geometries are candidates to probe and utilize the physical properties of atomically-thin materials. The vertical configuration enables a unique form of hot-carrier spectroscopy as well as atomic-scale devices. Here, we present the room-temperature evolution of heteroepitaxial perovskite hot-electron transistors using a SrRuO3 base down to the monolayer limit (∼4 Å). As a fundamental electronic probe, we observe an abrupt transition in the hot-electron mean free path as a function of base thickness, coinciding with the thickness-dependent resistive transition. As a path towards devices, we demonstrate the integrated synthesis of perovskite one-dimensional electrical edge contacts using water-soluble and growth-compatible Sr3Al2O6 hard masks. Edge-contacted monolayer-base transistors exhibit on/off ratios reaching ∼108, complete electrostatic screening by the base manifesting pure hot-electron injection, and excellent scaling of the output current density with device dimensions. These results open new avenues for incorporating emergent phenomena at oxide interfaces and in heterostructures.

Suggested Citation

  • Brian S. Y. Kim & Yasuyuki Hikita & Takeaki Yajima & Harold Y. Hwang, 2019. "Heteroepitaxial vertical perovskite hot-electron transistors down to the monolayer limit," Nature Communications, Nature, vol. 10(1), pages 1-7, December.
  • Handle: RePEc:nat:natcom:v:10:y:2019:i:1:d:10.1038_s41467-019-13290-3
    DOI: 10.1038/s41467-019-13290-3
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