On the Comparative Analysis among Topological Indices for Rhombus Silicate and Oxide Structures

A topological index (TI) is a numeric digit that signalizes the whole chemical structure of a molecular network. TIs are helpful in predicting the bioactivity of molecular substances in investigations of quantitative structure-activity relationship (QSAR) and quantitative structure-property relationship (QSPR). TIs correlate various chemical and physical attributes of chemical substances such as melting and freezing point, strain energy, stability, temperature, volume, density, and pressure. There are several distance-based descriptors available in the literature, but connection-based TIs are considered more effective than degree-based TIs in measuring the chemical characteristics of molecular compounds. The present study focuses on computing the connection-based TIs for the most significant type of chemical structures, namely, rhombus silicate and rhombus oxide networks. At the end, we compare these structures on the basis of their computed result.