Development of the EM Field in a Shielding Enclosure with Aperture after Interference Caused by a Subnanosecond High-Power Parallelly Polarized EM Plane Wave Pulse

Due to the increase in the threat of attacks with high-power electromagnetic (EM) pulses, there is great interest in metallic enclosures with high shielding effectiveness (SE). Necessary technological apertures in these enclosures reduce their effectiveness. Understanding the penetration and internal propagation of the high-power EM pulses into an apertured enclosure is fundamental to assessing the EM SE of the enclosure. In the present paper, results of the numerical simulations of development of the EM field in a shielding enclosure with aperture after the interference of a subnanosecond high-power EM plane wave pulse of the parallel polarization (having the duration of 0.3558 ns and the amplitudes of the electric and magnetic fields of 10 6 V/m and 2.6 × 10 3 A/m, respectively) are presented. The results obtained include 3D and 2D images , vector maps of the EM field developed inside the enclosure, and time-varying distributions of the electric charges formed on the inner walls of the enclosure. They revealed the mechanism of formation of the EM field inside the enclosure caused by the subnanosecond high-power parallelly polarized EM pulse. The EM field formed in the enclosure with aperture has the form of the electric and magnetic field interference structures. They are a superposition of the incident EM pulse field, which entered the enclosure through the aperture in the way described by the geometrical (ray) optics, the electric field generated by the electric charges formed on the aperture edges and inner sides of the walls of the enclosure, and the magnetic field generated by the surface current formed on the aperture edges and on the inner walls of the enclosure. The amplitudes of the electric and magnetic fields of the strongest EM interference structures decrease non-monotonically to about 0.7 × 10 5 V/m and 200 A/m at t = 5 ns. We found that the points in the enclosure are subjected to the disturbance of a long series of subnanosecond EM pulses, which we have called internal EM pulses. The amplitudes of these internal pulses are lower than those of the incident EM pulse. Nevertheless, they can pose a severe EM hazard inside the enclosure due to their large number (about 900 internal pulses in 30 ns). This means a fundamental change in the character of the EM disturbance caused by the subnanosecond pulse when the enclosure with aperture is used as a shield.