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Optimization of the growth rate of electrochromic WO3 coatings, in-situ grown by chemical vapor deposition at atmospheric pressure

Author

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  • Gogova, D
  • Stoyanov, G
  • Gesheva, K.A

Abstract

Electrochromic WO3 thin films on ITO-covered glass substrates are grown by Atmospheric Pressure Chemical Vapor Deposition (APCVD) using W(CO)6 as precursor. The process is pyrolytical decomposition of W(CO)6 in the presence of oxygen gas atmosphere. The growth rate was found to depend strongly on the oxygen flow-rate, as well as on the argon flow-rate through the precursor chamber. The optimization of these process parameters leads to high growth rates in the order of 30 Å/sec. Structural studies by Reflection High Energy Electron Diffraction (RHEED) and SEM show that the films are polycrystalline WO3 with a certain degree of texturing.

Suggested Citation

  • Gogova, D & Stoyanov, G & Gesheva, K.A, 1996. "Optimization of the growth rate of electrochromic WO3 coatings, in-situ grown by chemical vapor deposition at atmospheric pressure," Renewable Energy, Elsevier, vol. 8(1), pages 546-550.
    • Handle: RePEc:eee:renene:v:8:y:1996:i:1:p:546-550
    DOI: 10.1016/0960-1481(96)88915-4
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