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Screen printed titanium oxide and PECVD silicon nitride as antireflection coating on silicon solar cells

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  • Kishore, Ram
  • Singh, S.N.
  • Das, B.K.

Abstract

Silicon nitride and titanium oxide coatings have been used to reduce the reflection losses from silicon solar cells. Both 100-mm-diameter circular and 100 × 100 mm pseudo-square single crystalline silicon solar cells have been used in the present studies. More than 27% enhancement in the short circuit current has been demonstrated in polished cells using screen printed titanium oxide antireflection coating. Solar cells made from textured silicon wafers were used for plasma enhanced CVD grown silicon nitride antireflection coating on them. In these cells more than 23% enhancement in short-circuit current has been observed after silicon nitride antireflection coating.

Suggested Citation

  • Kishore, Ram & Singh, S.N. & Das, B.K., 1997. "Screen printed titanium oxide and PECVD silicon nitride as antireflection coating on silicon solar cells," Renewable Energy, Elsevier, vol. 12(2), pages 131-135.
    • Handle: RePEc:eee:renene:v:12:y:1997:i:2:p:131-135
    DOI: 10.1016/S0960-1481(97)00030-X
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