IDEAS home Printed from https://ideas.repec.org/a/eee/chsofr/v71y2015icp7-13.html
   My bibliography  Save this article

Multifractal characterization of a dental restorative composite after air-polishing

Author

Listed:
  • Ţălu, Ştefan
  • Stach, Sebastian
  • Alb, Sandu Florin
  • Salerno, Marco

Abstract

Roughness is of critical importance for the surface of dental materials. Air-polishing is a procedure commonly used on dental surfaces to remove the biofilm, however it can also damage the material surface. As a result its roughness is increased, and the possible fractal dimension, if any, may change. This study reviews atomic force microscope images of a reference dental restorative composite, treated with abrasive powders of either sodium bicarbonate or glycine, for times of 5, 10 or 30s, and from distances of 2 or 7mm. To fully characterize the structural complexity of surface damage, the images were analyzed according to both statistical parameters and multifractal approach. The singularity spectrum f(α) provided quantitative values data to characterize the local scale properties of 3D surface geometry at nanometer scale. The lowest roughening of the surfaces was obtained by air-polishing with glycine for 5s, independent of the used distance. This observation of least damage and thus best treatment was confirmed by the multifractal analysis. Multifractal analysis provides quantitative information complementary to that offered by traditional surface statistical parameters, with great potential for use also in the field of examination of quality of dental material surfaces.

Suggested Citation

  • Ţălu, Ştefan & Stach, Sebastian & Alb, Sandu Florin & Salerno, Marco, 2015. "Multifractal characterization of a dental restorative composite after air-polishing," Chaos, Solitons & Fractals, Elsevier, vol. 71(C), pages 7-13.
  • Handle: RePEc:eee:chsofr:v:71:y:2015:i:c:p:7-13
    DOI: 10.1016/j.chaos.2014.11.009
    as

    Download full text from publisher

    File URL: http://www.sciencedirect.com/science/article/pii/S0960077914001994
    Download Restriction: Full text for ScienceDirect subscribers only

    File URL: https://libkey.io/10.1016/j.chaos.2014.11.009?utm_source=ideas
    LibKey link: if access is restricted and if your library uses this service, LibKey will redirect you to where you can use your library subscription to access this item
    ---><---

    As the access to this document is restricted, you may want to search for a different version of it.

    More about this item

    Statistics

    Access and download statistics

    Corrections

    All material on this site has been provided by the respective publishers and authors. You can help correct errors and omissions. When requesting a correction, please mention this item's handle: RePEc:eee:chsofr:v:71:y:2015:i:c:p:7-13. See general information about how to correct material in RePEc.

    If you have authored this item and are not yet registered with RePEc, we encourage you to do it here. This allows to link your profile to this item. It also allows you to accept potential citations to this item that we are uncertain about.

    We have no bibliographic references for this item. You can help adding them by using this form .

    If you know of missing items citing this one, you can help us creating those links by adding the relevant references in the same way as above, for each refering item. If you are a registered author of this item, you may also want to check the "citations" tab in your RePEc Author Service profile, as there may be some citations waiting for confirmation.

    For technical questions regarding this item, or to correct its authors, title, abstract, bibliographic or download information, contact: Thayer, Thomas R. (email available below). General contact details of provider: https://www.journals.elsevier.com/chaos-solitons-and-fractals .

    Please note that corrections may take a couple of weeks to filter through the various RePEc services.

    IDEAS is a RePEc service. RePEc uses bibliographic data supplied by the respective publishers.